Optica Open
Browse

A nanolaser with extreme dielectric confinement

Download (5.58 kB)
preprint
posted on 2024-12-06, 17:00 authored by Meng Xiong, Yi Yu, Yury Berdnikov, Simon Klinck Borregaard, Adrian Holm Dubré, Elizaveta Semenova, Kresten Yvind, Jesper Mørk
The interaction between light and matter can be enhanced by spatially concentrating the light field to boost the photon energy density and increasing the photon dwell time to prolong energy transfer between light and matter. Traditionally, strong spatial light localization has been achieved using plasmonics, which, despite its effectiveness, entails ohmic losses. Recent advances in nanostructured dielectrics offer an avenue for achieving strong light confinement without metallic losses. However, previous studies primarily focused on minimizing the optical mode volume without adequately addressing light-matter interactions. Here, we develop a nanolaser that simultaneously localizes the electromagnetic field and excited carriers within the same region of a dielectric nanobridge. This extreme dielectric confinement of both light and matter achieves a mode volume below the diffraction limit and a subwavelength carrier volume without the introduction of lateral quantum confinement, enabling continuous-wave lasing at room-temperature. Moreover, we observe a strong correlation between the mode field and carrier distribution, and unexpectedly, the enhanced mode field localization automatically leads to more pronounced carrier localization, promoting self-alignment of light and matter, which significantly reduces the laser threshold. We quantify the intensified light-matter interaction with a newly proposed interaction volume, which generalizes the concept of mode volume to a broad class of active media. Our work lays the ground for developing ultra-efficient optoelectronic devices by greatly enhancing light-matter interactions through advanced material nanostructuring.

History

Related Materials

Disclaimer

This arXiv metadata record was not reviewed or approved by, nor does it necessarily express or reflect the policies or opinions of, arXiv.

Usage metrics

    Categories

    Licence

    Exports

    RefWorks
    BibTeX
    Ref. manager
    Endnote
    DataCite
    NLM
    DC