Compact Ultra-low Loss Optical True Delay Line on Thin Film Lithium
  Niobate

Ren, Yuan; Nan, Boyang; Wu, Rongbo; Zheng, Yong; Liu, Ruixue; Song, Yunpeng; Wang, Min; Cheng, Ya

doi:10.48550/arXiv.2501.11843

Compact Ultra-low Loss Optical True Delay Line on Thin Film Lithium Niobate

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posted on 2025-01-23, 17:01 authored by Yuan Ren, Boyang Nan, Rongbo Wu, Yong Zheng, Ruixue Liu, Yunpeng Song, Min Wang, Ya Cheng

We report the fabrication of an 8-meter-long thin-film lithium niobate (TFLN) optical true delay line (OTDL) using the photolithography-assisted chemomechanical etching (PLACE) technique, showing a low transmission loss of 0.036 dB/cm in the conventional telecom band.

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URL - References https://doi.org/10.48550/arXiv.2501.11843

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Compact Ultra-low Loss Optical True Delay Line on Thin Film Lithium Niobate

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