Version 2 2023-06-09, 07:11Version 2 2023-06-09, 07:11
Version 1 2023-06-08, 08:42Version 1 2023-06-08, 08:42
preprint
posted on 2023-06-09, 07:11authored byZhihao Zhang, Shanming Li, Renhong Gao, Haisu Zhang, Jintian Lin, Zhiwei Fang, Rongbo Wu, Min Wang, Zhenhua Wang, Yin Hang, Ya Cheng
Photonic integrated waveguide amplifier fabricated on erbium-ytterbium (Er-Yb) co-doped thin-film lithium niobate (TFLN) has been investigated in this work. A small-signal internal net gain of 27 dB is achieved at the signal wavelength of 1532nm in the fabricated Er-Yb TFLN-waveguide amplifier pumped by the diode laser at ~980nm. Experimental characterizations reveal the advantage of waveguide fabrication by the photolithography assisted chemo-mechanical etching (PLACE) technique, and also the benefit from Yb-sensitized-Er in promoting the gain performance. The demonstrated high-gain chip-scale TFLN-amplifier is promising to be interfaced with established lithium niobate integrated devices, greatly extending the spectrum of TFLN photonic applications.
History
Funder Name
National Key Research and Development Program of China; National Natural Science Foundation of China; Science and Technology Commission of Shanghai Municipality; Shanghai Pujiang Program