Version 2 2023-06-09, 07:11Version 2 2023-06-09, 07:11
Version 1 2023-06-08, 08:42Version 1 2023-06-08, 08:42
preprint
posted on 2023-06-09, 07:11authored byZhihao Zhang, Shanming Li, Renhong Gao, Haisu Zhang, Jintian Lin, Zhiwei Fang, Rongbo Wu, Min Wang, Zhenhua Wang, Yin Hang, Ya Cheng
Photonic integrated waveguide amplifier fabricated on erbium-ytterbium (Er-Yb) co-doped thin-film lithium niobate (TFLN) has been investigated in this work. A small-signal internal net gain of 27 dB is achieved at the signal wavelength of 1532nm in the fabricated Er-Yb TFLN-waveguide amplifier pumped by the diode laser at ~980nm. Experimental characterizations reveal the advantage of waveguide fabrication by the photolithography assisted chemo-mechanical etching (PLACE) technique, and also the benefit from Yb-sensitized-Er in promoting the gain performance. The demonstrated high-gain chip-scale TFLN-amplifier is promising to be interfaced with established lithium niobate integrated devices, greatly extending the spectrum of TFLN photonic applications.
National Key Research and Development Program of China; National Natural Science Foundation of China; Science and Technology Commission of Shanghai Municipality; Shanghai Pujiang Program