Full C- and L-band tunable erbium-doped integrated lasers via scalable manufacturing

Erbium (Er) ions are the gain medium of choice for fiber-based amplifiers and lasers, offering a long excited-state lifetime, slow gain relaxation, low amplification nonlinearity and noise, and temperature stability compared to semiconductor-based platforms. Recent advances in ultra-low-loss silicon nitride (Si$_3$N$_4$) photonic integrated circuits, combined with ion implantation, have enabled the realization of high-power on-chip Er amplifiers and lasers with performance comparable to fiber-based counterparts, supporting compact photonic systems. Yet, these results are limited by the high (2 MeV) implantation beam energy required for tightly confined Si$_3$N$_4$ waveguides (700 nm height), preventing volume manufacturing of Er-doped photonic integrated circuits. Here, we overcome these limitations and demonstrate the first fully wafer-scale, foundry-compatible Er-doped photonic integrated circuit-based tunable lasers. Using 200 nm-thick Si$_3$N$_4$ waveguides, we reduce the ion beam energy requirement to below 500 keV, enabling efficient wafer-scale implantation with an industrial 300 mm ion implanter. We demonstrate a laser wavelength tuning range of 91 nm, covering nearly the entire optical C- and L-bands, with fiber-coupled output power reaching 36 mW and an intrinsic linewidth of 95 Hz. The temperature-insensitive properties of erbium ions allowed stable laser operation up to 125$^{\circ}$C and lasing with less than 15 MHz drift for over 6 hours at room temperature using a remote fiber pump. The fully scalable, low-cost fabrication of Er-doped waveguide lasers opens the door for widespread adoption in coherent communications, LiDAR, microwave photonics, optical frequency synthesis, and free-space communications.