Local laser oxidation of titanium film for post-fabrication trimming of
  photonic integrated circuits

Tronev, Aleksandr V.; Parfenov, Mikhail V.; Bozhko, Sergey I.; Ionov, Andrey M.; Mozhchil, Rais N.; Chekmazov, Sergey V.; Agruzov, Petr M.; Ilichev, Igor V.; Shamrai, Aleksandr V.

doi:10.48550/arXiv.2111.02884

Local laser oxidation of titanium film for post-fabrication trimming of photonic integrated circuits

preprint

posted on 2023-01-10, 02:22 authored by Aleksandr V. Tronev, Mikhail V. Parfenov, Sergey I. Bozhko, Andrey M. Ionov, Rais N. Mozhchil, Sergey V. Chekmazov, Petr M. Agruzov, Igor V. Ilichev, Aleksandr V. Shamrai

Local laser oxidation of a thin titanium film is considered as a means of a precise adjustment of losses and effective refractive index of dielectric optical waveguides. A fine phase control of an operating point and extinction ratio enhancement up to 57 dB were demonstrated using an integrated optical Ti:LiNbO3 Mach-Zehnder modulator. This technique only slightly affects the dielectric waveguide material and is very promising for a high precision permanent trimming of photonic devices based on dielectric waveguides of different material platforms and fabrication technologies.

History

Related Materials

1.
URL - References https://doi.org/10.48550/arXiv.2111.02884
2.
DOI - Is supplement to Local laser oxidation of titanium film for post-fabrication trimming of photonic integrated circuits

Disclaimer

This arXiv metadata record was not reviewed or approved by, nor does it necessarily express or reflect the policies or opinions of, arXiv.

Local laser oxidation of titanium film for post-fabrication trimming of photonic integrated circuits

History

Related Materials

Disclaimer

Usage metrics

Categories

Keywords

Licence

Exports