Nonlinearity and wavelength control in ultrashort-pulse subsurface material processing

The pronounced dependence of the nonlinear parameters of both dielectric and semiconductor materials on the wavelength, and the nonlinear interaction between the ultra-short laser pulse and the material requires precise control of the wavelength of the pulse, in addition to the precise control of the pulse energy, pulse duration and focusing optics. This becomes particularly important for fine sub-wavelength single pulse sub-surface processing. Based on two different numerical models and taking Si as example material, we investigate the spatio-temporal behavior of a pulse propagating through the material while covering a broad range of parameters. The wavelength-dependence of material processing depends on the different contributions of two- and tree-photon absorption in combination with the Kerr effect which results in a particularly sharp nonlinear peak at ~2100 nm. We could show that in silicon this makes processing preferable close to this wavelength. The impact of the nonlinear nonparaxial propagation effects on spatio-temporal beam structure is also investigated. It could be shown that with increasing wavelength and large focusing angles the aberrations at the focal spot can be reduced, and thereby cleaner and more precise processing can be achieved. Finally, we could show that the optimum energy transfer from the pulse to the material is within a narrow window of pulse durations between 600 to 900 fs.