Projection version of Quantum Optical Lithography with Type I diffracted photons

The suppression of wave-particle duality in multiple slit experiments has indicated the presence of Type I diffracted photons with particle behavior. The breakdown of the diffraction limit is possible with Type I diffracted photons and it will be applied in optical lithography. In this paper, we present results regarding a diffractionless optical lithography, Projection Quantum Optical Lithography (Projection QOL), with different NA projection lens and resolution of ~ 14 nm. A potential application for the realization of 1 nm complex patterns is analyzed. Projection QOL could sustain R&D efforts of semiconductor chip industry.